| アイテムタイプ |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2024-02-27 |
| タイトル |
|
|
タイトル |
Design of an apertureless two-stage acceleration lens for a single-ion implantation system |
|
言語 |
en |
| 言語 |
|
|
言語 |
eng |
| 資源タイプ |
|
|
資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
|
資源タイプ |
journal article |
| 著者 |
Ishii Yasuyuki
Okubo Takeru
Miyawaki Nobumasa
Yuri Yosuke
Onoda Shinobu
Narumi Kazumasa
|
| 抄録 |
|
|
内容記述タイプ |
Abstract |
|
内容記述 |
A single-ion-implantation (SII) system with an implantation accuracy of several tens of nanometers and energy of several tens of kilo-electron volts (keV) is developed to produce an array of nitrogen-vacancy centers (NV centres). The device with the array is expected to be used for quantum information technologies. The system consists of a Paul-trap type laser cooling device (PTLCD) and an electrostatic focusing lens. The PTLCD generates a few single-nitrogen-ions via an ion-cooling procedure. The SII system needs the implantation of single-nitrogen ions with 100% probability, called “deterministic implantation,” to build the array. A focusing lens without an aperture and with a magnification of ≪ 1 must be developed to realize the deterministic implantation. In this study, an electrostatic focusing lens, namely a two-stage acceleration lens, was designed by mainly investigating a second acceleration lens that is suitable for the SII system based on the previously developed two-stage acceleration lens. A new two-stage acceleration lens with a magnification of 0.006 was designed and a numericalsimulation based on the lens demonstrated that the beam width for a single-nitrogen ion with an energy of 14 keV was 4.5 nm including intrinsic aberrations at full width at half maximum. |
| 書誌情報 |
Nuclear Instruments and Methods in Physics Research B
巻 541,
p. 200-204,
発行日 2024-02
|
| DOI |
|
|
|
識別子タイプ |
DOI |
|
|
関連識別子 |
https://doi.org/10.1016/j.nimb.2023.05.021 |