| アイテムタイプ |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2024-02-11 |
| タイトル |
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|
タイトル |
Design of High-sensitive Resist Materials Based on Polyacetals |
|
言語 |
ja |
| 言語 |
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|
言語 |
jpn |
| 資源タイプ |
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|
資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
|
資源タイプ |
journal article |
| 著者 |
前川 紘之
Yutaro Iwashige
山本 洋揮
Kazumasa Okamoto
Takahiro Koazawa
Hiroto Kudo
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| 抄録 |
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内容記述タイプ |
Abstract |
|
内容記述 |
We examined the synthesis and resist properties of various polyacetals. The synthesized polyacetals had good physical properties (thermal stability, solubility and film-forming ablility) and good film-thickness loss property. Their resist sensitivities in the EB exposure system were higher, indicating that these resist materials are good candidate to offer higher resolution resist pattern. |
| 書誌情報 |
J. Photopolymer Science and Technology
発行日 2023-05
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