| アイテムタイプ |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2024-06-07 |
| タイトル |
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タイトル |
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure |
|
言語 |
en |
| 言語 |
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|
言語 |
eng |
| 資源タイプ |
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|
資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
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資源タイプ |
journal article |
| 著者 |
Oota Yousuke
Sekiguchi Atsushi
Shinji Yamakawa
Tetsuo Harada
Takeo Watanabe
Yamamoto Hiroki
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| 抄録 |
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内容記述タイプ |
Abstract |
|
内容記述 |
It has been reported that the good correlation in sensitivity and resolution between EUV exposure and EB exposure because of the similar acid generation mechanism in resists during exposure. However, in the early stages of EUV resist development, there are problems on the points of the cost and time-consuming to evaluate all EUV resist materials by EB exposure. Therefore, we investigated the possibility of using KrF exposure as the initial screening of EUV resists. |
| 書誌情報 |
Journal of Photopolymer Science and Technology
巻 35,
号 1,
p. 49-54,
発行日 2022-12
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| 出版者 |
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出版者 |
The Society of Photopolymer Science and Technology |
| ISSN |
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収録物識別子タイプ |
ISSN |
|
収録物識別子 |
1349-6336 |
| DOI |
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識別子タイプ |
DOI |
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関連識別子 |
10.2494/photopolymer.35.49 |
