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Nb/Si multilayer mirror for high power EUV light source
https://repo.qst.go.jp/records/72902
https://repo.qst.go.jp/records/72902ed904745-4a5c-4533-bf81-f9a5d78fd346
| Item type | 会議発表用資料 / Presentation(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2018-08-23 | |||||
| タイトル | ||||||
| タイトル | Nb/Si multilayer mirror for high power EUV light source | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_c94f | |||||
| 資源タイプ | conference object | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
Ichimaru, Satoshi
× Ichimaru, Satoshi× Hatayama, Masatoshi× 錦野, 将元× 石野, 雅彦× Kinoshita, Hiroo× Oku, Satoshi× 錦野 将元× 石野 雅彦 |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | We developed and experimentally investigated a Nb/Si multilayer mirror for high power EUV light sources. The multilayer deposited by magnetron sputtering system has a reflectivity of 64% at 13.5 nm. As a first demonstration, this value is not inferior to that of conventional Mo/Si multilayer mirror. For investigating highpower irradiation tolerance, EUV damage threshold was measured by using SACLA BL1. The input beam specifications are as below; power density of 60 mJ/cm2, pulse duration of 1100 fs, wavelength of 13.5 nm, 10 shots, and incident angle of 45 deg. The observed beam profiles clearly show that the damage threshold of Nb/Si multilayer mirror is higher than that of Mo/Si multilayer mirror. In detail measurements, damage threshold of Nb/Si multilayer mirror was estimated to as twice as that of Mo/Si multilayer mirror. The results will be extremely useful to drivie new standard multilayer mirrors developments for industrial uses. | |||||
| 会議概要（会議名, 開催地, 会期, 主催者等） | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | International Conference on Synchrotron Radiation Instrumentation (SRI 2018) | |||||
| 発表年月日 | ||||||
| 日付 | 2018-06-11 | |||||
| 日付タイプ | Issued | |||||
