{"created":"2023-05-15T14:53:32.051603+00:00","id":72902,"links":{},"metadata":{"_buckets":{"deposit":"d3a5381c-bd00-419a-a972-53a4196f8da4"},"_deposit":{"created_by":1,"id":"72902","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"72902"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00072902","sets":["10:28"]},"author_link":["718344","718349","718350","718345","718346","718351","718347","718348"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2018-06-11","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"We developed and experimentally investigated a Nb/Si multilayer mirror for high power EUV light sources. The multilayer deposited by magnetron sputtering system has a reflectivity of 64% at 13.5 nm. As a first demonstration, this value is not inferior to that of conventional Mo/Si multilayer mirror. For investigating highpower irradiation tolerance, EUV damage threshold was measured by using SACLA BL1.  The input beam specifications are as below; power density of 60 mJ/cm2, pulse duration of 1100 fs, wavelength of 13.5 nm, 10 shots, and incident angle of 45 deg. The observed beam profiles clearly show that the damage threshold of Nb/Si multilayer mirror is higher than that of Mo/Si multilayer mirror. In detail measurements, damage threshold of Nb/Si multilayer mirror was estimated to as twice as that of Mo/Si multilayer mirror. The results will be extremely useful to drivie new standard multilayer mirrors developments for industrial uses. ","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"International Conference on Synchrotron Radiation Instrumentation (SRI 2018)","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Ichimaru, Satoshi"}],"nameIdentifiers":[{"nameIdentifier":"718344","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hatayama, Masatoshi"}],"nameIdentifiers":[{"nameIdentifier":"718345","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"錦野, 将元"}],"nameIdentifiers":[{"nameIdentifier":"718346","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石野, 雅彦"}],"nameIdentifiers":[{"nameIdentifier":"718347","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kinoshita, Hiroo"}],"nameIdentifiers":[{"nameIdentifier":"718348","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Oku, Satoshi"}],"nameIdentifiers":[{"nameIdentifier":"718349","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"錦野 将元","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"718350","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石野 雅彦","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"718351","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"Nb/Si multilayer mirror for high power EUV light source","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Nb/Si multilayer mirror for high power EUV light source"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-08-23"},"publish_date":"2018-08-23","publish_status":"0","recid":"72902","relation_version_is_last":true,"title":["Nb/Si multilayer mirror for high power EUV light source"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:34:50.908723+00:00"}