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Development of in situ synchrotron X-ray total scattering setup under pressurized hydrogen gas
https://repo.qst.go.jp/records/49160
https://repo.qst.go.jp/records/49160de3c145a-15c3-4607-a59d-c7b40f4ed538
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2018-09-05 | |||||
| タイトル | ||||||
| タイトル | Development of in situ synchrotron X-ray total scattering setup under pressurized hydrogen gas | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
Sakaki, Kouji
× Sakaki, Kouji× Kim, Hyunjeong× Machida, Akihiko× Watanuki, Tetsu× Katayama, Yoshinori× Nakamura, Yumiko× 町田 晃彦× 綿貫 徹× 片山 芳則 |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | We have developed an in situ gas‐loading sample holder for synchrotron X‐ray total scattering experiments, particularly for hydrogen storage materials, designed to collect diffraction and pair distribution function (PDF) data under pressurized hydrogen gas. A polyimide capillary with a diameter and thickness of 1.4 and 0.06 mm, respectively, connected with commercially available fittings was used as an in situ sample holder. Gas-leakage tests confirmed that this sample holder allows 3 MPa of hydrogen gas pressure and 393 K to be achieved without leakage. Using the developed in situ sample holder, significant background and Bragg peaks from the sample holder were not observed in the X‐ray total scattering patterns and their signal‐to‐noise ratios were sufficiently good. The results of Rietveld and PDF refinements of Ni powder are consistent with those obtained using a polyimide capillary (1.0 mm diameter and 0.04 mm thickness) that has been used for ex situ experiments. In addition, in situ synchrotron X‐ray total scattering experiments under pressurized hydrogen gas up to 1 MPa were successfully demonstrated for LaNi4.6Cu. | |||||
| 書誌情報 |
Journal of Applied Crystallography 巻 51, 号 3, p. 796-801, 発行日 2018-05 |
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| 出版者 | ||||||
| 出版者 | Wiley Online Library | |||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 1600-5767 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1107/S1600576718005101 | |||||
