{"created":"2023-05-15T15:03:23.237218+00:00","id":85866,"links":{},"metadata":{"_buckets":{"deposit":"0ee5a9ce-db96-4f51-a426-a4c9f6761583"},"_deposit":{"created_by":1,"id":"85866","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"85866"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00085866","sets":["1"]},"author_link":["1043893","1043897","1043895","1043896","1043899","1043894","1043898"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2022-03","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"SD1006-4","bibliographicPageStart":"SD1006-1","bibliographicVolumeNumber":"61","bibliographic_titles":[{"bibliographic_title":"Japanese Journal of Applied Physics"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Dry film resists (DFRs) are suitable for the fabrication of large volume devices as the thickness of the film can be easily controlled. Here, the DFR microstructures were patterned using the proton beam writing (PBW) technique by taking advantages of the direct-write process, straight trajectories of protons, and large processing depth. The results show that the required irradiation dose of 15 μm DFR was 10 nC mm−2 for 1 MeV protons. In summary, we have optimized the PBW conditions to create smooth surface micropatterns with a vertical wall in the DFR.","subitem_description_type":"Abstract"}]},"item_8_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"応用物理学会物理系学術誌刊行センター"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.35848/1347-4065/ac55e1","subitem_relation_type_select":"DOI"}}]},"item_8_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://iopscience.iop.org/article/10.35848/1347-4065/ac55e1/meta","subitem_relation_type_select":"URI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0021-4922","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Hironori, Sek(芝浦工業大学)"}],"nameIdentifiers":[{"nameIdentifier":"1043893","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Keiya, Kawamura(芝浦工業大学)"}],"nameIdentifiers":[{"nameIdentifier":"1043894","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hidetaka, Hayashi(芝浦工業大学)"}],"nameIdentifiers":[{"nameIdentifier":"1043895","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yasuyuki, Ishii"}],"nameIdentifiers":[{"nameIdentifier":"1043896","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Nitipon Puttaraksa(King Mongkut’s University of Technology Thonburi, Thailand)"}],"nameIdentifiers":[{"nameIdentifier":"1043897","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hiroyuki, Nishikawa(芝浦工業大学)"}],"nameIdentifiers":[{"nameIdentifier":"1043898","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yasuyuki, Ishii","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1043899","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Utilizing a photosensitive dry film resist in proton beam writing","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Utilizing a photosensitive dry film resist in proton beam writing"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2022-04-06"},"publish_date":"2022-04-06","publish_status":"0","recid":"85866","relation_version_is_last":true,"title":["Utilizing a photosensitive dry film resist in proton beam writing"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T17:18:47.053703+00:00"}