@article{oai:repo.qst.go.jp:00085763,
 author = {Tetsuya, Kimata and Kazutaka, Nakamura and Tetsuya, Yamaki and Tetsuya, Kimata and Tetsuya, Yamaki},
 journal = {High-Energy Chemistry and Processing in Liquids (Chap. 16)},
 month = {Feb},
 note = {Chapter 16: Electrocatalysts Developed from Ion-Implanted Carbon Materials

Ion implantation is known as a powerful tool to modify a host material by energetic effects such as sputtering, impurity doping, and defect creation. In addition to semiconductor-device manufacturing, the development of catalytic materials has been an emerging application for realizing electrochemical energy conversion and storage devices including water-splitting and fuel cells. This chapter deals with ion implantation in different carbon materials implementing two strategic concepts based on morphology and electronic structures; i.e., nanoparticle (NP) formation and surface/interface modification. Initially, the metal ion-implanted NPs were exposed on the top surface of the carbon support to work as an electrocatalyst, while they are embedded in the carbon support to indirectly affect the surface morphology and active sites of the surrounding carbon-based electrocatalysts. Next, the N-doping in carbon was very effective in controlling the surface of the carbon-based catalyst or the interface states between a metal-NP catalyst and a carbon support. Finally, implantation induced defects in the graphitic lattice controlled the NP-support interface so that the electrocatalytic activity of the overlying NPs could be improved. Ion beam technology can offer a new approach for catalyst design toward the improvement of the activity and durability.},
 title = {High-Energy Chemistry and Processing in Liquids (Chap. 16)},
 year = {2022}
}