{"created":"2023-05-15T15:01:26.222073+00:00","id":83344,"links":{},"metadata":{"_buckets":{"deposit":"89362082-0557-4be7-81da-5af5adb26cb5"},"_deposit":{"created_by":1,"id":"83344","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"83344"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00083344","sets":["10:29"]},"author_link":["1001533","1001530","1001529","1001538","1001539","1001531","1001535","1001537","1001532","1001534","1001536"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2021-11-05","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"軟X線分光分析においては、近年Li-K発光（22.8 nm）近辺でのリチウム電池材料や13.5 nm付近でのEUVリソ材料の状態分析や微量分析などの重要性が益々高まっている。それに伴い、この領域で分光素子として広く使われている軟X線回折格子の分解能や回折効率などの基本性能の向上を図ることが必要となってきている。本研究では、10～30 nm 域で用いる軟X線回折格子において、回折格子溝形状と入射角の最適化とともに、通常の金等の金属表面のラミナー型回折格子に新たな増反射膜を付加し、回折効率と共に分析感度と相関性のある回折格子が取り込む光量と回折効率の積であるSpectral fluxを指標とし、その増大を図ることとした。そのため、鏡面反射での予備検討で22.83 nmにおいて高い反射率を示したB4Cを上記の回折格子面上に積層することとした。回折格子を製作し、実験的に評価するため、現在この領域で実際に分光に供せられているラミナー型回折格子（刻線密度：1200 本/mm，デューティ比：0.3，溝深さ：20 nm，表面物質：Au、推奨入射角：86.0°）を仮定し数値計算で最適化を行った。その結果、回折効率を指標とした場合、入射角：78.2°、B4Cの厚さ：22 nmで、Spectral fluxを指標とした場合、入射角：74.0°、B4Cの厚さ：14 nmでそれぞれの指標が22.83 nmで極大を示し、広い波長範囲でそれぞれ高い数値を示すことが判った。発表では低入射角化で現れる偏光依存性についても触れる。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"第57回X線分析討論会","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"小池, 雅人"}],"nameIdentifiers":[{"nameIdentifier":"1001529","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"村野, 孝訓"}],"nameIdentifiers":[{"nameIdentifier":"1001530","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"越谷, 翔悟"}],"nameIdentifiers":[{"nameIdentifier":"1001531","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"羽多野, 忠"}],"nameIdentifiers":[{"nameIdentifier":"1001532","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"ピロジコフ, アレキサンダー"}],"nameIdentifiers":[{"nameIdentifier":"1001533","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"垣尾, 翼"}],"nameIdentifiers":[{"nameIdentifier":"1001534","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"林, 信和"}],"nameIdentifiers":[{"nameIdentifier":"1001535","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"長野, 哲也"}],"nameIdentifiers":[{"nameIdentifier":"1001536","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"寺内, 正己"}],"nameIdentifiers":[{"nameIdentifier":"1001537","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masato, Koike","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1001538","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Pirozhkov, Alexander","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1001539","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"極端紫外 (EUV) 域低入射角高回折効率ラミナー型回折格子の開発","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"極端紫外 (EUV) 域低入射角高回折効率ラミナー型回折格子の開発"}]},"item_type_id":"10005","owner":"1","path":["29"],"pubdate":{"attribute_name":"公開日","attribute_value":"2021-08-17"},"publish_date":"2021-08-17","publish_status":"0","recid":"83344","relation_version_is_last":true,"title":["極端紫外 (EUV) 域低入射角高回折効率ラミナー型回折格子の開発"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:37:26.234723+00:00"}