{"created":"2023-05-15T14:59:20.765486+00:00","id":80515,"links":{},"metadata":{"_buckets":{"deposit":"f06f8c30-c188-478d-b98d-6954dbca5b29"},"_deposit":{"created_by":1,"id":"80515","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"80515"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00080515","sets":["10:29"]},"author_link":["889126","889124","889130","889131","889134","889125","889135","889128","889132","889129","889127","889133"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2020-09-14","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"イオンマイクロビームを用いた描画技術（Particle Beam Writing: PBW）により、ワイドバンドギャップ半導体中蛍光欠陥をマイクロメートルスケールで配列する技術について講演する。講演では、プロトンマイクロビームを用いたPBWにより製作したダイヤモンド内の二次元・三次元的な配列の蛍光欠陥や、SiC内の二次元的な配列の蛍光欠陥、さらに窒素ビームを用いた窒素-空孔センターの作製技術について紹介する。これらを通じて、PBWと他の粒子線照射技術との複合利用が、ダイヤモンドやSiC等のワイドバンドギャップ半導体中に蛍光欠陥を形成するための照射技術として有用であることを示す。本講演はICNMTA2020での招待講演である。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"7th International Conference on Nuclear Microprobe Technology and Applications (ICNMTA2020)","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"W., Kada(群大)"}],"nameIdentifiers":[{"nameIdentifier":"889124","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"M., Haruyama(群大)"}],"nameIdentifiers":[{"nameIdentifier":"889125","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"H., Higuchi(群大)"}],"nameIdentifiers":[{"nameIdentifier":"889126","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Y., Suda(群大)"}],"nameIdentifiers":[{"nameIdentifier":"889127","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ishii, Yasuyuki"}],"nameIdentifiers":[{"nameIdentifier":"889128","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Onoda, Shinobu"}],"nameIdentifiers":[{"nameIdentifier":"889129","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ohshima, Takeshi"}],"nameIdentifiers":[{"nameIdentifier":"889130","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Miura, K."}],"nameIdentifiers":[{"nameIdentifier":"889131","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"O., Hanaizumi(群大)"}],"nameIdentifiers":[{"nameIdentifier":"889132","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ishii, Yasuyuki","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"889133","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Onoda, Shinobu","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"889134","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ohshima, Takeshi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"889135","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"Micro-meter-scaled fluorescent defect formation in wide bandgap semiconductor by utilizing proton/particle beam writing technique","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Micro-meter-scaled fluorescent defect formation in wide bandgap semiconductor by utilizing proton/particle beam writing technique"}]},"item_type_id":"10005","owner":"1","path":["29"],"pubdate":{"attribute_name":"公開日","attribute_value":"2020-09-15"},"publish_date":"2020-09-15","publish_status":"0","recid":"80515","relation_version_is_last":true,"title":["Micro-meter-scaled fluorescent defect formation in wide bandgap semiconductor by utilizing proton/particle beam writing technique"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T21:31:18.039704+00:00"}