@article{oai:repo.qst.go.jp:00079898,
 author = {Mikami, Katsuhiro and Ishino, Masahiko and Dinh, Thanhhung and Motokoshi, Shinji and Hasegawa, Noboru and Kon, Akira and Inubushi, Yuichi and Owada, Shigeki and Kinoshita, Hiroo and Nishikino, Masaharu and Ishino, Masahiko and Dinh, Thanhhung and Hasegawa, Noboru and Kon, Akira and Nishikino, Masaharu},
 issue = {8},
 journal = {Optics Letters},
 month = {Apr},
 note = {Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs obtained in this research by the femtosecond SXFEL and the picosecond SXRL were nearly identical, but were different from that by the nanosecond soft x-ray pulse. The photoionization processes of silica glass in context of the laser-induced damage mechanism (LIDM) are also discussed. In the ultra-short soft x-ray pulse irradiation regime, the LIDM can be speculated to include the spallation process with a scission of bondings.},
 pages = {2435--2438},
 title = {Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation},
 volume = {45},
 year = {2020}
}