{"created":"2023-05-15T14:58:34.495842+00:00","id":79469,"links":{},"metadata":{"_buckets":{"deposit":"295cd827-a495-41cb-b457-b4c7e273a9f8"},"_deposit":{"created_by":1,"id":"79469","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"79469"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00079469","sets":["1"]},"author_link":["1004528","1004531","1004525","1004529","1004530","1004524","1004526","1004527"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2020-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"6","bibliographicPageEnd":"810 ","bibliographicPageStart":" 805","bibliographicVolumeNumber":"32","bibliographic_titles":[{"bibliographic_title":"Journal of Photopolymer Science and Technology "}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"We examined the synthesis and resist properties of tellurium-containing molecular resist materials. By the condensation reaction of anisol, phenol, and 2-phenylphenol with tellurium tetrachloride (TeCl4), dichloro di(4-hydroxyphenyl) telluride (CHPT), dichloro di(4-hydroxy-3-phenylbenz) telluride (CHBT), di(4-hydroxyphenyl) telluride (HPT), and di(4-hydoxy-3-phenylbenz) telluride (HBT) were synthesized. These were reacted with 2-methyl-2-adamantyl bromo acetate, yielding corresponding compounds CHPT-AD, CHBT-AD, HPT-AD, and HBT-AD, respectively. By the examination of resist properties (thickness loss property, resist sensitivity, and etching durability), CHBT-AD could be good candidate for higher resolution EUV resist material.","subitem_description_type":"Abstract"}]},"item_8_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Journal of Photopolymer Science and Technology "}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2494/photopolymer.32.805","subitem_relation_type_select":"DOI"}}]},"item_8_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://www.jstage.jst.go.jp/article/photopolymer/32/6/32_805/_article/-char/ja/","subitem_relation_type_select":"URI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0914-9244","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{"nameIdentifier":"1004524","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Mari Fukunaga"}],"nameIdentifiers":[{"nameIdentifier":"1004525","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Teppei Yamada"}],"nameIdentifiers":[{"nameIdentifier":"1004526","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shinji Yamakawa"}],"nameIdentifiers":[{"nameIdentifier":"1004527","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Takeo Watanabe"}],"nameIdentifiers":[{"nameIdentifier":"1004528","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yamamoto, Hiroki"}],"nameIdentifiers":[{"nameIdentifier":"1004529","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kazumasa Okamoto"}],"nameIdentifiers":[{"nameIdentifier":"1004530","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hiroki, Yamamoto","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1004531","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2020-03-16"},"publish_date":"2020-03-16","publish_status":"0","recid":"79469","relation_version_is_last":true,"title":["Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:26:58.562279+00:00"}