{"created":"2023-05-15T14:57:30.593622+00:00","id":78045,"links":{},"metadata":{"_buckets":{"deposit":"234740f7-6011-4bc0-b6cb-aa4adef17ee2"},"_deposit":{"created_by":1,"id":"78045","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"78045"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00078045","sets":["10:28"]},"author_link":["814182","814183"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2020-02-26","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"EUVリソグラフィの性能を制約すると考えられている、フォトレジストのストキャステイックス（光子の統計的な揺らぎ）の効果の解析について報告する。元に、EUVリソグラフィにおける露光過程、光の吸収とレジスト分子の溶解度変化の特徴について考察したのち、フォトレジストの露光過程をパーコレーションモデルにより、現像過程をDLA（Diffusion LImited Aggregation）モデルを用いて解析し、EUV強度に対する感度、解像度、ラフネスの限界と、その改善のために必要な技術について考察する。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"SPIE Advanced Lithography 2020","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Sasaki, Akira"}],"nameIdentifiers":[{"nameIdentifier":"814182","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Sasaki, Akira","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"814183","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"Investigation of statistical limit of resolution of resists for EUV lithography using combined percolation and DLA model","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Investigation of statistical limit of resolution of resists for EUV lithography using combined percolation and DLA model"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2019-05-07"},"publish_date":"2019-05-07","publish_status":"0","recid":"78045","relation_version_is_last":true,"title":["Investigation of statistical limit of resolution of resists for EUV lithography using combined percolation and DLA model"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T23:29:15.389210+00:00"}