{"created":"2023-05-15T14:56:19.053160+00:00","id":76492,"links":{},"metadata":{"_buckets":{"deposit":"a4e70fa3-d3d7-434b-91b3-e714eb569331"},"_deposit":{"created_by":1,"id":"76492","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"76492"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00076492","sets":["1"]},"author_link":["883493","883490","883489","883487","883495","883491","883496","883494","883486","883497","883488","883485","883492","883484"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2019-08","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"7","bibliographicPageStart":"073109","bibliographicVolumeNumber":"115","bibliographic_titles":[{"bibliographic_title":"Applied Physics Letters"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Short-pulse extreme ultraviolet (EUV) of a free-electron laser (FEL) is a prime candidate as a next-generation EUV lithography light source.\nHowever, the physical events and chemical reactions in resist materials, induced by the short-pulse EUV, have not yet been elucidated.\nIn this study, the morphological and chemical changes in poly(methyl methacrylate) (PMMA) induced by picosecond-pulsed EUV were investigated using an X-ray laser (XRL) as a touchstone for next-generation EUV-FEL lithography.\nThe XRL is suitable for the evaluation of resist materials in next-generation EUV-FEL lithography because of its short pulse width (7 ps) and high intensity (approximately 200 nJ/pulse at a maximum).\nThe sensitivity of PMMA upon exposure to a 7 ps XRL pulse was enhanced by approximately 50 times in comparison with using conventional EUV sources, which have a typical pulse width of the order of nanoseconds.\nX-ray photoelectron spectroscopy revealed the decomposition of both the main and side chains of PMMA after XRL irradiation. \nThese changes only occurred for relatively high doses of EUV irradiation at picosecond timescales. \nThus, the results suggest the importance of a specific resist design for next-generation EUV-FEL lithography.","subitem_description_type":"Abstract"}]},"item_8_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"American Institute of Physics "}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1063/1.5116284","subitem_relation_type_select":"DOI"}}]},"item_8_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://aip.scitation.org/doi/10.1063/1.5116284","subitem_relation_type_select":"URI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0003-6951","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Hosaka, Yuji"}],"nameIdentifiers":[{"nameIdentifier":"883484","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Oyama, Tomoko"}],"nameIdentifiers":[{"nameIdentifier":"883485","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yamamoto, Hiroki"}],"nameIdentifiers":[{"nameIdentifier":"883486","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ishino, Masahiko"}],"nameIdentifiers":[{"nameIdentifier":"883487","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Dinh, Thanhhung"}],"nameIdentifiers":[{"nameIdentifier":"883488","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Nishikino, Masaharu"}],"nameIdentifiers":[{"nameIdentifier":"883489","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Maekawa, Yasunari"}],"nameIdentifiers":[{"nameIdentifier":"883490","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hosaka, Yuji","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"883491","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Oyama, Tomoko","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"883492","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yamamoto, Hiroki","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"883493","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ishino, Masahiko","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"883494","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Dinh, Thanhhung","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"883495","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Nishikino, Masaharu","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"883496","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Maekawa, Yasunari","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"883497","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Sensitivity enhancement of poly(methyl methacrylate) upon exposure to picosecond-pulsed extreme ultraviolet","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Sensitivity enhancement of poly(methyl methacrylate) upon exposure to picosecond-pulsed extreme ultraviolet"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2019-08-19"},"publish_date":"2019-08-19","publish_status":"0","recid":"76492","relation_version_is_last":true,"title":["Sensitivity enhancement of poly(methyl methacrylate) upon exposure to picosecond-pulsed extreme ultraviolet"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T21:38:03.264239+00:00"}