{"created":"2023-05-15T14:56:14.362155+00:00","id":76382,"links":{},"metadata":{"_buckets":{"deposit":"d25edbf8-e2e9-4f7b-8659-d3a791e3986d"},"_deposit":{"created_by":1,"id":"76382","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"76382"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00076382","sets":["10:29"]},"author_link":["772412","772409","772419","772416","772418","772406","772421","772413","772404","772415","772408","772405","772402","772420","772403","772410","772414","772411","772422","772417","772407","772423"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2019-08-01","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"高強度・極短パルスレーザー電子加速の実験結果を報告する。我々は、関西研にある200 TW, 40 fsレーザーをf/10の光学系を用いて純ヘリウムまたはヘリウムに窒素ガス、ネオンガスを混ぜた混合ガスを用いてイオン化入射法の試験を行った。その結果、窒素ガスを用いた場合には、100 pCを超える大電荷量の数百MeV準単色電子ビームを観測し、ネオンガスを用いた場合には低発散角のビームを観測した。これらは、ガスのイオン化強度に依存した電子入射領域の体積と入射タイミングが影響していると考えられ、ガス種による電子加速の制御が行えることを示唆している。\n ","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"第16回日本加速器学会年会","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"神門, 正城"}],"nameIdentifiers":[{"nameIdentifier":"772402","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"黄, 開"}],"nameIdentifiers":[{"nameIdentifier":"772403","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Neagu, 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