{"created":"2023-05-15T14:55:59.298636+00:00","id":76033,"links":{},"metadata":{"_buckets":{"deposit":"a1c39e2c-5421-4811-bc5c-af358a3e20e7"},"_deposit":{"created_by":1,"id":"76033","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"76033"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00076033","sets":["10:28"]},"author_link":["762496","762497","762494","762499","762495","762498"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2019-06-12","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":" 極短パルスレーザーをシリコンに集光することによってレーザーアブレーションを起こし、波長132 nm の真空紫外プローブパルスの時間分解反射スペクトルを測定した。アブレーションによる反射スペクトルの減衰に対してFROG解析行い、真空紫外パルスのパルス幅を 16 fs と決定し、スペクトル位相も決定した。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"OPTO2019","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"板倉, 隆二"}],"nameIdentifiers":[{"nameIdentifier":"762494","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"赤木, 浩"}],"nameIdentifiers":[{"nameIdentifier":"762495","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"乙部, 智仁"}],"nameIdentifiers":[{"nameIdentifier":"762496","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Itakura, Ryuuji","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"762497","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Akagi, Hiroshi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"762498","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Otobe, Tomohito","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"762499","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"VUV waveform characterization by reflectivity depletion in laser ablation of Si","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"VUV waveform characterization by reflectivity depletion in laser ablation of Si"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2019-06-04"},"publish_date":"2019-06-04","publish_status":"0","recid":"76033","relation_version_is_last":true,"title":["VUV waveform characterization by reflectivity depletion in laser ablation of Si"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-16T00:41:09.728655+00:00"}