{"created":"2023-05-15T14:54:56.057507+00:00","id":74643,"links":{},"metadata":{"_buckets":{"deposit":"1e695a25-1bfa-48d2-b0ec-9cf67050992e"},"_deposit":{"created_by":1,"id":"74643","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"74643"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00074643","sets":["10:28"]},"author_link":["735595","735594"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2019-02-28","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Improvement of the resolution, line-edge roughness (LWR), and sensitivity of photoresists have an essential importance for the realization of the extreme ultraviolet (EUV) lithography. We show the image formation of photoresists for the extreme-ultraviolet lithography (EUV) using computer simulation. We develop a combined percolation and diffusion-limited aggregation model to investigate image formation to see how the roughness initially produced by the photon shot noise develops during the process of development. ","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"SPIE Advanced Lithography会議出席","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"佐々木, 明"}],"nameIdentifiers":[{"nameIdentifier":"735594","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Sasaki, Akira","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"735595","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"Simulation of statistical effects in exposure and development of EUV photoresists using the percolation and diffusion limited aggregation model","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Simulation of statistical effects in exposure and development of EUV photoresists using the percolation and diffusion limited aggregation model"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2019-03-07"},"publish_date":"2019-03-07","publish_status":"0","recid":"74643","relation_version_is_last":true,"title":["Simulation of statistical effects in exposure and development of EUV photoresists using the percolation and diffusion limited aggregation model"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-16T07:52:09.506419+00:00"}