{"created":"2023-05-15T14:53:45.884724+00:00","id":73215,"links":{},"metadata":{"_buckets":{"deposit":"1c1c2051-5e49-478e-ba2c-7d4f7e8c79ad"},"_deposit":{"created_by":1,"id":"73215","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"73215"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00073215","sets":["10:28"]},"author_link":["721616","721624","721617","721622","721620","721623","721618","721619","721621"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2019-02-15","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"表面物質がNiである軟X線回折格子表面上にTiO2（CeO2） を堆積しB-K 発光で回折効率が極大となる膜厚と入射角を探索し、膜厚22.0 nm（30.2 nm）及び入射角85.262°、（84.496°）を得た。放射光を用いて測定した結果、従来のNi回折格子を入射角87.070°で用いる場合に対して、受光立体角の増加も考慮した場合、光量が2.4倍(TiO2)、3.8倍(CeO2)に増加した。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"応用物理学会関西支部平成30年度第3回講演会","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"小池, 雅人"}],"nameIdentifiers":[{"nameIdentifier":"721616","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"寺内, 正己"}],"nameIdentifiers":[{"nameIdentifier":"721617","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"羽多野, 忠"}],"nameIdentifiers":[{"nameIdentifier":"721618","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"高橋, 秀之"}],"nameIdentifiers":[{"nameIdentifier":"721619","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"村野, 孝訓"}],"nameIdentifiers":[{"nameIdentifier":"721620","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"高倉, 優"}],"nameIdentifiers":[{"nameIdentifier":"721621","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"長野, 哲也"}],"nameIdentifiers":[{"nameIdentifier":"721622","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"笹井, 浩行"}],"nameIdentifiers":[{"nameIdentifier":"721623","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"小池 雅人","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"721624","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"ボロンK発光(183eV)分光計測のための酸化物膜付加による 高回折効率・広受光角軟X線ラミナー型回折格子の開発","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"ボロンK発光(183eV)分光計測のための酸化物膜付加による 高回折効率・広受光角軟X線ラミナー型回折格子の開発"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2019-02-20"},"publish_date":"2019-02-20","publish_status":"0","recid":"73215","relation_version_is_last":true,"title":["ボロンK発光(183eV)分光計測のための酸化物膜付加による 高回折効率・広受光角軟X線ラミナー型回折格子の開発"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:31:45.944307+00:00"}