{"created":"2023-05-15T14:53:35.350237+00:00","id":72977,"links":{},"metadata":{"_buckets":{"deposit":"a22c892a-74d3-42b1-b70c-6204bc4ec0c2"},"_deposit":{"created_by":1,"id":"72977","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"72977"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00072977","sets":["10:28"]},"author_link":["719086","719087","719088","719097","719090","719089","719093","719096","719092","719095","719094","719091"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2018-09-18","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"A compact electron cyclotron resonance (ECR) ion source with all permanent magnet has been developed for basic experiments and ion implantation with various ion species at National Institute of Radiological Sciences (NIRS). Although the present Kei2-type ion sources are dedicated for the high-energy carbon-ion radiotherapy,  a future ion source is expected: 1) production of carbon-ion for medical use, 2) production of various ions with a charge-to-mass ratio of 1/3 for the existed linac injector, and 3) low cost for modification from the Kei2-type. A prototype compact ECR ion source, named Kei3, based on Kei2  has been developed to correspond to produce various ions. Figure 1 shows schematic drawing of Kei3 source. The Kei3 has an outer diameter of 280 mm and a length of 1120 mm. Kei3 consists of upstream vacuum chamber, permanent magnets and plasma chamber, and downstream vacuum chamber with extraction system. The magnetic field was copied from Kei2. As a results of beam tests, we obtained maximum beam current of C4+, N5+, O6+ and Ne7+ were 565 μA, 185 μA, 99 μA and 50.5 μA, respectively. \nIn order to increase a beam current of heavy ion such as argon, we modify the microwave injection. The waveguide was made 20 mm longer from original design and the tip of waveguide was set to the mirror peak of injection side. Figure 2 shows charge state distributions (CSD) of Argon. In the case of longer waveguide (red line), highly charged ion was increased.","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"22nd International Conference on Ion Implantation Technology (IIT 2018)","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Muramatsu, Masayuki"}],"nameIdentifiers":[{"nameIdentifier":"719086","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hamada, Kouta"}],"nameIdentifiers":[{"nameIdentifier":"719087","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kato, Yushi"}],"nameIdentifiers":[{"nameIdentifier":"719088","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Suzuki, Taku"}],"nameIdentifiers":[{"nameIdentifier":"719089","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Takahashi, Katsuyuki"}],"nameIdentifiers":[{"nameIdentifier":"719090","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ouchi, Fumihisa"}],"nameIdentifiers":[{"nameIdentifier":"719091","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kitagawa, Atsushi"}],"nameIdentifiers":[{"nameIdentifier":"719092","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"村松 正幸","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719093","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"濱田 滉太","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719094","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"加藤 裕史","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719095","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"大内 章央","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719096","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"北川 敦志","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719097","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"Optimization of microwave injection at compact ECR ion source","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Optimization of microwave injection at compact ECR ion source"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-10-16"},"publish_date":"2018-10-16","publish_status":"0","recid":"72977","relation_version_is_last":true,"title":["Optimization of microwave injection at compact ECR ion source"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:34:04.246034+00:00"}