{"created":"2023-05-15T14:53:30.828537+00:00","id":72874,"links":{},"metadata":{"_buckets":{"deposit":"fbe5718b-01f4-4add-b104-ae4226f2cb1a"},"_deposit":{"created_by":1,"id":"72874","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"72874"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00072874","sets":["10:28"]},"author_link":["718055","718054","718051","718053","718052","718050"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2018-06-13","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"EUVリソグラフィにおいて問題とされているレジスト上の露光パターンの粗さに対するストキャスティクスの効果について、パーコレーションモデルによる解析を試みた。高感度、高解像度の材料として期待される金属ナノ粒子を用いたネガ型レジストを想定したシミュレーションを行い、パターンの形成に閾値があることや、なめらかなパターンを得るためには閾値の3倍程度の照射強度が必要であることを示す結果を得た。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"2018 EUVL workshop","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"佐々木, 明"}],"nameIdentifiers":[{"nameIdentifier":"718050","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石野, 雅彦"}],"nameIdentifiers":[{"nameIdentifier":"718051","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"錦野, 将元"}],"nameIdentifiers":[{"nameIdentifier":"718052","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"佐々木 明","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"718053","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石野 雅彦","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"718054","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"錦野 将元","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"718055","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"Percolation Model of the Stochastic Effect of EUV Resists","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Percolation Model of the Stochastic Effect of EUV Resists"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-07-25"},"publish_date":"2018-07-25","publish_status":"0","recid":"72874","relation_version_is_last":true,"title":["Percolation Model of the Stochastic Effect of EUV Resists"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:35:09.506699+00:00"}