{"created":"2023-05-15T14:53:26.114056+00:00","id":72767,"links":{},"metadata":{"_buckets":{"deposit":"41e9fdb2-7d16-4977-87c1-d04ae3759fba"},"_deposit":{"created_by":1,"id":"72767","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"72767"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00072767","sets":["10:28"]},"author_link":["716781","716779","716783","716780","716784","716785","716782"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2018-05-09","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"高強度EUV光に対して高い耐久性を持つ新規多層膜材料系を探索することを目的として、EUV用多層膜の候補となる様々な多層膜材料に対する損傷実験を行った。その結果、新規多層膜材料であるNb/Si多層膜は、Mo/Si多層膜と同等の反射率が得られること、XFELに対する損傷閾値がMo/Si多層膜より高いことを発見した。このNb/Si多層膜に対する詳細な研究は十分ではないため、今後、さらなる耐久性と反射率向上の可能性がある。また、多層膜の損傷メカニズムは解明途上であることから、損傷機構の解明によって、多層膜の更なる高品質化に寄与できると考えられる。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"光・量子ビーム科学合同シンポジウム2018（OPTO2018）","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"畑山, 雅俊"}],"nameIdentifiers":[{"nameIdentifier":"716779","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"市丸, 智"}],"nameIdentifiers":[{"nameIdentifier":"716780","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石野, 雅彦"}],"nameIdentifiers":[{"nameIdentifier":"716781","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"錦野, 将元"}],"nameIdentifiers":[{"nameIdentifier":"716782","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"木下, 博雄"}],"nameIdentifiers":[{"nameIdentifier":"716783","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石野 雅彦","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"716784","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"錦野 将元","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"716785","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"高耐力軟Ｘ線光学素子の開発","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"高耐力軟Ｘ線光学素子の開発"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-05-01"},"publish_date":"2018-05-01","publish_status":"0","recid":"72767","relation_version_is_last":true,"title":["高耐力軟Ｘ線光学素子の開発"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:36:17.649869+00:00"}