{"created":"2023-05-15T14:52:58.735552+00:00","id":72299,"links":{},"metadata":{"_buckets":{"deposit":"d008bd5f-93c3-483e-bb91-35398453f790"},"_deposit":{"created_by":1,"id":"72299","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"72299"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00072299","sets":["10:28"]},"author_link":["712123","712121","712122","712125","712124"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2017-03-20","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"次世代半導体リソグラフィ技術のためのレーザー生成プラズマEUV光源において、プリパルスレーザー照射でSn液滴ターゲットを粒子に分散する過程の最適化のために行っている、加熱された液滴が溶融、蒸発する際の構造形成の物理モデル、数値シミュレーション手法の研究について報告した。メッシュの動的再配置および熱平衡状態を過程した相転移モデルによって、気液相転移の過程および、生成した気泡や粒子のダイナミクスを計算する手法を開発し、結果の検証を行った。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"日本物理学会第72回年次大会","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"佐々木, 明"}],"nameIdentifiers":[{"nameIdentifier":"712121","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"佐々木明"}],"nameIdentifiers":[{"nameIdentifier":"712122","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"砂原淳"}],"nameIdentifiers":[{"nameIdentifier":"712123","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"西原功修"}],"nameIdentifiers":[{"nameIdentifier":"712124","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"佐々木 明","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"712125","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"EUV光源用ターゲットのアブレーションにおける 気泡、粒子の生成過程","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"EUV光源用ターゲットのアブレーションにおける 気泡、粒子の生成過程"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-04-26"},"publish_date":"2017-04-26","publish_status":"0","recid":"72299","relation_version_is_last":true,"title":["EUV光源用ターゲットのアブレーションにおける 気泡、粒子の生成過程"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:41:29.587703+00:00"}