{"created":"2023-05-15T14:52:43.645014+00:00","id":71989,"links":{},"metadata":{"_buckets":{"deposit":"2cf411c9-2f90-4612-b436-190eb6ce6cd7"},"_deposit":{"created_by":1,"id":"71989","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"71989"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00071989","sets":["10:28"]},"author_link":["709060","709062","709064","709061","709059","709063"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2016-08-09","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"放射線の生物的影響の解明には、水の電離/励起を起因とする活性酸素種(ROS)の生成が生体へ及ぼす影響を探る必要がある。我々は電子常磁性共鳴(EPR)スピントラッピングを用いて、放射線によるヒドロキシルラジカル(•OH)の生成には疎と密な生成があることを報告した。\n本研究では、２種類の生成密度について、テレフタル酸ニナトリウム(TPA-Na)を用いた化学プローブ法によって更に検証を行った。また、•OHと同時に生成する水素ラジカルは、溶存酵素と反応しヒドロペルオキシラジカル(HO₂•)を生じる。HO₂•は脂質過酸化の原因となり、その生成量評価は放射線防護の観点から重要である。テレフタル酸ニナトリウム(TPA-Na)を用いて、X線によって生じる•OHとHO₂•の同時検出を試みた。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":" Free Radical  Summer School 2016 in TATEYAMA","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"小川, 幸大"}],"nameIdentifiers":[{"nameIdentifier":"709059","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"関根, 絵美子"}],"nameIdentifiers":[{"nameIdentifier":"709060","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"松本, 謙一郎"}],"nameIdentifiers":[{"nameIdentifier":"709061","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"小川 幸大","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"709062","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"関根 絵美子","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"709063","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"松本 謙一郎","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"709064","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"テレフタル酸を用いた放射線によるヒドロキシルラジカル生成密度の測定","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"テレフタル酸を用いた放射線によるヒドロキシルラジカル生成密度の測定"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2016-08-17"},"publish_date":"2016-08-17","publish_status":"0","recid":"71989","relation_version_is_last":true,"title":["テレフタル酸を用いた放射線によるヒドロキシルラジカル生成密度の測定"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:45:04.406558+00:00"}