@misc{oai:repo.qst.go.jp:00071940,
 author = {石野, 雅彦 and 市丸, 智 and 錦野, 将元 and 長谷川, 登 and 畑山, 雅俊 and 河内, 哲哉 and 奥, 哲 and 石野 雅彦 and 錦野 将元 and 長谷川 登 and 河内 哲哉},
 month = {May},
 note = {To study the damage mechanism of EUV multilayers, we have performed irradiation experiments of SXRL pulses having a wavelength of 13.9 nm and duration of 7 ps onto multilayers.  By varying the irradiation fluence, the damage threshold could be estimated quantitatively. The estimated damage threshold of the EUV multilayer varies with the film material. However, the threshold did not depend on number of multilayer periods. We can conclude that the damage threshold is a parameter related to the film material only., XOPT(X線光学素子、検出器光源とその応用に関する国際会議)},
 title = {Damage on EUV multilayer optics caused by irradiation of focused pico-second soft x-ray laser pulses},
 year = {2016}
}