{"created":"2023-05-15T14:51:55.342519+00:00","id":70977,"links":{},"metadata":{"_buckets":{"deposit":"be69c62a-53ff-4640-8f97-e5bab389501c"},"_deposit":{"created_by":1,"id":"70977","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"70977"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00070977","sets":["10:28"]},"author_link":["697635","697636","697634","697628","697618","697632","697619","697633","697637","697617","697622","697624","697626","697623","697621","697631","697620","697627","697630","697629","697625"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2012-10-27","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The damage structure of latent tracks in Polyimide (PI) films, KAPTON and UPILEX, has been examined by Fourier transform infrared (FT-IR) measurements. Results are compared with those from previous studies on poly(ethylene terephthalate) (PET), bisphenol A polycarbonate (PC), and poly(allyl diglycol carbonate) (PADC). These polymers are exposed to protons and heavy ions (He, C, Ne, Si, Ar, Fe, Kr, and Xe ) in air with energies less than 6 MeV/n, as well as gamma rays from an intense Co-60 source [1-5]. Chemical damage parameters, namely, damage density, which is the number of losses of considered functional groups per unit length of tracks, radial size of the track core, in which the considered chemical groups are lost, and radiation chemical yields (G values) for each group are evaluated as a function of the stopping power. It has been confirmed that latent tracks will be etchable when the radial track core size is larger than the distance between two adjacent breaking points of polymer chains. The predominant breaking points are the C-O bonds in diphenyl ether, ester, carbonate ester, and ether bonds.","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"8ｔｈ International Symposium on Swift Heavy Ions in Mater","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Yamauchi, Tomoya"}],"nameIdentifiers":[{"nameIdentifier":"697617","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Mori, Yutaka"}],"nameIdentifiers":[{"nameIdentifier":"697618","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kanasaki, Masato"}],"nameIdentifiers":[{"nameIdentifier":"697619","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hattori, Atsuto"}],"nameIdentifiers":[{"nameIdentifier":"697620","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Matai, Yuri"}],"nameIdentifiers":[{"nameIdentifier":"697621","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Matsukawa, Kenya"}],"nameIdentifiers":[{"nameIdentifier":"697622","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Oda, Keiji"}],"nameIdentifiers":[{"nameIdentifier":"697623","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kodaira, Satoshi"}],"nameIdentifiers":[{"nameIdentifier":"697624","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kitamura, Hisashi"}],"nameIdentifiers":[{"nameIdentifier":"697625","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Konishi, Teruaki"}],"nameIdentifiers":[{"nameIdentifier":"697626","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yasuda, Nakahiro"}],"nameIdentifiers":[{"nameIdentifier":"697627","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Tojo, Sachiko"}],"nameIdentifiers":[{"nameIdentifier":"697628","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Honda, Yoshihide"}],"nameIdentifiers":[{"nameIdentifier":"697629","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Barillon, Remi"}],"nameIdentifiers":[{"nameIdentifier":"697630","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"服部 篤人","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"697631","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"又井 悠里","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"697632","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"松川 兼也","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"697633","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"小平 聡","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"697634","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"北村 尚","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"697635","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"小西 輝昭","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"697636","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"バリロン レミ","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"697637","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"Thresholds of Etchable Track Formation and Chemical Damage Parameters in PI, PET, PC, and PADC Films at the Stopping Powers Ranging from 10 to 12,000 keV/um","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Thresholds of Etchable Track Formation and Chemical Damage Parameters in PI, PET, PC, and PADC Films at the Stopping Powers Ranging from 10 to 12,000 keV/um"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2012-11-13"},"publish_date":"2012-11-13","publish_status":"0","recid":"70977","relation_version_is_last":true,"title":["Thresholds of Etchable Track Formation and Chemical Damage Parameters in PI, PET, PC, and PADC Films at the Stopping Powers Ranging from 10 to 12,000 keV/um"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:56:37.337559+00:00"}