{"created":"2023-05-15T14:50:11.990901+00:00","id":68651,"links":{},"metadata":{"_buckets":{"deposit":"da05b6eb-50d5-4e29-a76f-6fb231aae1ad"},"_deposit":{"created_by":1,"id":"68651","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"68651"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00068651","sets":["10:28"]},"author_link":["673754","673759","673755","673752","673760","673756","673757","673749","673750","673751","673753","673758"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2006-09-08","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"水の放射線分解で発生するラジカルによる生体への作用を間接作用と呼んでおり、なかでもヒドロキシルラジカル（OH・）がもっとも反応性に富み、組織傷害性が強いと考えられている。本研究では高LET粒子線照射で発生するOH・のLET依存性、温度依存性、酸素依存性について検討することを目的とした。\n200mMのDMPO水溶液を照射し、OH・を補足したDMPO-OHのESR（電子スピン共鳴）スペクトルを、照射後正確に10分で測定した。また1mg/mlサケ精子由来DNA水溶液を照射し、グアニンの酸化生成物である8-OHdGをHPLC-ECD（電気化学的検出器）法で解析した。照射時のサンプル内の溶存酸素による影響を調べるため、あらかじめアルゴン置換を施したものと大気条件下のサンプルを照射した。また照射時温度の影響を調べるため、サンプルは4℃と37℃で照射した。照射にはC（290MeV/135MeV）とＳｉ（490MeV）を用い、比較のためにエックス線（200kV, 200mA）を用いた。\nESR法で測定したOH・もHPLC-ECD法で測定した8-OHdGも、いずれもLET値が高くなるにつれて減少する傾向を示した。アルゴンで置換されたサンプルではいずれも値が小さくなる傾向を示し、また37℃で照射したものの方が4℃で照射したものよりも高い値を示した。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"日本放射線影響学会第49回大会","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"盛武, 敬"}],"nameIdentifiers":[{"nameIdentifier":"673749","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"田草川, 光子"}],"nameIdentifiers":[{"nameIdentifier":"673750","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"上野, 恵美"}],"nameIdentifiers":[{"nameIdentifier":"673751","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ｍａｎｄａ, Ｋａｉｌａｓｈ"}],"nameIdentifiers":[{"nameIdentifier":"673752","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"菅沢, 麻美"}],"nameIdentifiers":[{"nameIdentifier":"673753","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"安西, 和紀"}],"nameIdentifiers":[{"nameIdentifier":"673754","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"盛武 敬","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"673755","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"田草川 光子","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"673756","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"上野 恵美","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"673757","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ｍａｎｄａ Ｋａｉｌａｓｈ","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"673758","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"菅沢 麻美","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"673759","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"安西 和紀","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"673760","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"高LET粒子線照射で発生するOHラジカルの解析","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"高LET粒子線照射で発生するOHラジカルの解析"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2006-09-11"},"publish_date":"2006-09-11","publish_status":"0","recid":"68651","relation_version_is_last":true,"title":["高LET粒子線照射で発生するOHラジカルの解析"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T20:23:44.356881+00:00"}