@misc{oai:repo.qst.go.jp:00066885,
 author = {Kusutomo, Tamon and Mori, Yutaka and Kanasaki, Masato and Oda, Keiji and Kodaira, Satoshi and Barillon, Remi and Yamauchi, Tomoya and 楠本 多聞 and 小平 聡},
 month = {Aug},
 note = {Poly(allyl diglycol carbonate), PADC, has been recognized as the most sensitive Etched Track Detector, ETD,. A series of FT-IR spectrometric studies has been carried out to understand the latent track structure in exposed to gamma ray, X-ray, 28 MeV electron, proton and heavy ions. Based on these experiments, we found that the number of electrons which passed through a certain repeat unit of PADC is the most important parameter to express the detection threshold of etch pit formation [1]. 
In the present study, irradiation effects of UV photon with a wave length of 222 nm are examined [2]. The number density of ether decreases with increasing the photon fluence while that of carbonyl decrease above a critical fluence of 3.0×1019 photons/cm2 (Figure 1). The decarboxylation with releasing CO or CO2 gasses is also observed. The spatial distribution of UV defects are discussed using conventional track overlapping model to elucidate the two steps damage formation process [3]. The result expresses that continuous damages are never expected during photon exposures. 
References: 
[1] T. Kusumoto et al., JPS. Conf. Proc. 11, 010001 (2016).
[2] A. Sakamoto et al., Review of Graduate School of Maritime Sciences,  7, 87 (2010).
[3] T. Yamauchi, Raidat. Meas. 36, 73 (2003)., The Ionizing Radiation and Polymers symposium (IRAP2018)},
 title = {Drastic decrease of carbonyl group following the loss of ether in PADC exposed to 222 nm UV photons},
 year = {2018}
}