{"created":"2023-05-15T14:48:40.494998+00:00","id":66682,"links":{},"metadata":{"_buckets":{"deposit":"26cb420b-88bc-4ca7-be3a-c07d02995cfe"},"_deposit":{"created_by":1,"id":"66682","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"66682"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00066682","sets":["10:29"]},"author_link":["655736","655739","655741","655737","655735","655740","655738","655742"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2018-03-20","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"EUVリソグラフィで重要な高感度、高解像度レジストの開発のために、メタルレジストの露光の特性をパーコレーションモデルで解析することを試みた。パターンの形成には閾値があること、なめらかなパターンを形成するためには閾値の３倍程度の照射線量が必要なことを示す結果得られた。","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"第６５回応用物理学会春季学術講演会","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"佐々木, 明"}],"nameIdentifiers":[{"nameIdentifier":"655735","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石野, 雅彦"}],"nameIdentifiers":[{"nameIdentifier":"655736","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"錦野, 将元"}],"nameIdentifiers":[{"nameIdentifier":"655737","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"前川, 康成"}],"nameIdentifiers":[{"nameIdentifier":"655738","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"佐々木 明","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"655739","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石野 雅彦","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"655740","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"錦野 将元","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"655741","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"前川 康成","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"655742","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"EUVリソグラフィにおけるレジスト露光過程の統計的性質のモデリング","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"EUVリソグラフィにおけるレジスト露光過程の統計的性質のモデリング"}]},"item_type_id":"10005","owner":"1","path":["29"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-03-22"},"publish_date":"2018-03-22","publish_status":"0","recid":"66682","relation_version_is_last":true,"title":["EUVリソグラフィにおけるレジスト露光過程の統計的性質のモデリング"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T20:46:11.738565+00:00"}