{"created":"2023-05-15T14:39:50.493153+00:00","id":54677,"links":{},"metadata":{"_buckets":{"deposit":"4b856374-2821-4655-8457-e971abc8eee0"},"_deposit":{"created_by":1,"id":"54677","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"54677"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00054677","sets":["2"]},"author_link":["558797","558793","558796","558795","558792","558794"],"item_10003_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2016-11","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"1280","bibliographicPageStart":"1277","bibliographic_titles":[{"bibliographic_title":"第13回日本加速器学会年会プロシーディングス"}]}]},"item_10003_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"フィルム線量計の一種であるガフクロミックフィルムは、高い空間分解能で簡便な計測が可能である等の利点から、1～10MeV/uオーダーのイオンビームの強度分布計測に利用されている。本研究では、表面保護膜がなく感受層が剥き出しであるガフクロミックフィルムHD-V2について、より低いエネルギー（keV/uオーダー）での利用可能性を実験的に調べた。フィルムの着色応答特性のエネルギー依存性を系統的に明らかにするため、TIARAのサイクロトロン、タンデム加速器、イオン注入装置を用いて、27MeV/uから1.5keV/uまでの炭素等のイオンビームをHD-V2フィルムへ照射した。その結果、エネルギーが低いほど吸光度変化が小さくなるが、10keV/uオーダーまでのビームに対して2次元照射野分布計測が行えることが分かった。","subitem_description_type":"Abstract"}]},"item_10003_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"http://www.pasj.jp/web_publish/pasj2016/proceedings/index.html"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://www.pasj.jp/web_publish/pasj2016/proceedings/index.html","subitem_relation_type_select":"URI"}}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"百合, 庸介"}],"nameIdentifiers":[{"nameIdentifier":"558792","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"鳴海, 一雅"}],"nameIdentifiers":[{"nameIdentifier":"558793","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"湯山, 貴裕"}],"nameIdentifiers":[{"nameIdentifier":"558794","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"百合 庸介","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"558795","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"鳴海 一雅","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"558796","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"湯山 貴裕","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"558797","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"ガフクロミックフィルムの低エネルギーイオンビーム強度分布計測への適用","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"ガフクロミックフィルムの低エネルギーイオンビーム強度分布計測への適用"}]},"item_type_id":"10003","owner":"1","path":["2"],"pubdate":{"attribute_name":"公開日","attribute_value":"2016-12-12"},"publish_date":"2016-12-12","publish_status":"0","recid":"54677","relation_version_is_last":true,"title":["ガフクロミックフィルムの低エネルギーイオンビーム強度分布計測への適用"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T22:58:05.593098+00:00"}