{"created":"2023-05-15T14:38:26.193805+00:00","id":49610,"links":{},"metadata":{"_buckets":{"deposit":"da34867e-2d87-4fb0-8e39-6ab07ecfcb03"},"_deposit":{"created_by":1,"id":"49610","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"49610"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00049610","sets":["1"]},"author_link":["501169","501170","501172","501168","501167","501171"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2018-10","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"2","bibliographicPageEnd":"225","bibliographicPageStart":"221","bibliographicVolumeNumber":"31","bibliographic_titles":[{"bibliographic_title":"Journal of Photopolymer Science and Technology"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":" We synthesized tannic acid derivatives with pendant cyclohexyl acetal moieties (TA-CVEn), butyl acetal moieties (TA-BVEn), and adamantyl ester moieties (TA-ADn) by the reaction of tannnic acid (TA) with cyclohexyl vinyl ether (CVE), butyl vinyl ether (BVE), and adamantyl bromo acetate (AD) in various feeds ratios. The synthesized TA-CVEn, TA-BVEn, and TA-ADn had good solubility, good film-forming ability, and high thermal stability relevant to application of photolithography materials.  However, only TA-BVE97 and TA-AD74 can be used as positive-type photo-resist materials using 2.38wt% TMAH aq. as developer due to the result of thickness loss property. Furthermore, their resist-sensitivity upon EUV exposure tool and etching durability were adequate and they have high potential as next-generation resist material for EUV photolithography.","subitem_description_type":"Abstract"}]},"item_8_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Society of Photopolymer Science and Technology"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2494/photopolymer.31.221","subitem_relation_type_select":"DOI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0914-9244","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{"nameIdentifier":"501167","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shizuya, Ohori"}],"nameIdentifiers":[{"nameIdentifier":"501168","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ogawa, Hiroki"}],"nameIdentifiers":[{"nameIdentifier":"501169","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"山本, 洋揮"}],"nameIdentifiers":[{"nameIdentifier":"501170","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kozawa, Takahiro"}],"nameIdentifiers":[{"nameIdentifier":"501171","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"山本 洋揮","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"501172","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Lithography System","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Lithography System"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2019-02-12"},"publish_date":"2019-02-12","publish_status":"0","recid":"49610","relation_version_is_last":true,"title":["Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Lithography System"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T23:19:00.251034+00:00"}