{"created":"2023-05-15T14:37:41.367757+00:00","id":48618,"links":{},"metadata":{"_buckets":{"deposit":"74c2ac33-b3a2-4148-8fbb-e0b0839cf760"},"_deposit":{"created_by":1,"id":"48618","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"48618"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00048618","sets":["1"]},"author_link":["488918","488917"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2017-07","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"21","bibliographicPageEnd":"5829","bibliographicPageStart":"5824","bibliographicVolumeNumber":"56","bibliographic_titles":[{"bibliographic_title":"Applied Optics"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"A Mo/Si multilayer-coated photodiode detector (MP) for beam-intensity monitoring was prototyped and characterized using synchrotron radiation and X-ray laser (XRL) sources, in order to perform polarization analysis of a laser-driven plasma soft XRL generated from nickel-like silver plasma. At a wavelength of 13.9 nm and an angle of incidence of 45°, the s-polarization reflectance is 0.525 and shows a strong positive correlation with the transmittance corresponding to the photodiode current generated by the MP. We succeeded in performing polarization analysis of XRL beams with a large shot-to-shot intensity variation using the MP. Thus, this MP enables shot-to-shot monitoring and delivery of high intensity beams for downstream XRL experiments.","subitem_description_type":"Abstract"}]},"item_8_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Optical Society of America"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1364/AO.56.005824","subitem_relation_type_select":"DOI"}}]},"item_8_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"https://www.osapublishing.org/ao/abstract.cfm?uri=ao-56-21-5824"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://www.osapublishing.org/ao/abstract.cfm?uri=ao-56-21-5824","subitem_relation_type_select":"URI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"2155-3165","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"今園, 孝志"}],"nameIdentifiers":[{"nameIdentifier":"488917","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"今園 孝志","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"488918","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Multilayer-coated photodiode-based beam intensity monitor for polarization analysis of plasma soft X-ray laser","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Multilayer-coated photodiode-based beam intensity monitor for polarization analysis of plasma soft X-ray laser"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-03-22"},"publish_date":"2018-03-22","publish_status":"0","recid":"48618","relation_version_is_last":true,"title":["Multilayer-coated photodiode-based beam intensity monitor for polarization analysis of plasma soft X-ray laser"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T23:26:10.485406+00:00"}