{"created":"2023-05-15T14:37:34.397819+00:00","id":48468,"links":{},"metadata":{"_buckets":{"deposit":"d2533e6e-a6f9-4e5a-8a15-bf9cfdcf1097"},"_deposit":{"created_by":1,"id":"48468","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"48468"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00048468","sets":["1"]},"author_link":["487274","487275","487276","487273","487277"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2017-11","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"11","bibliographicPageEnd":"515","bibliographicPageStart":"510","bibliographicVolumeNumber":"81","bibliographic_titles":[{"bibliographic_title":"日本金属学会誌"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"室温の多結晶タングステン結晶表面に窒素原子イオンと窒素分子イオンを2.5keVのエネルギーで照射した。SPring-8で放射光を用いて光電子分光分析した結果、W4f7/2と W4f5/2ピークの半値幅の広がりと、WO3に相当するピークの僅かな増加を観測した。このことは表面酸化膜下での窒化を意味している。窒素イオン照射後のN1s光電子ピークは４つの成分を持っている。これは標準的なタングステン酸窒化物と同じである。主ピークはW-N結合とW-N-O結合に対応する。W-N結合のN1s光電子ピークとW4f光電子ピークの比の深さ依存性から、N2+イオン照射の場合の方がN+イオン照射の場合より、W-N結合の密度が高く、少し深くまで窒素が侵入することが分かった。","subitem_description_type":"Abstract"}]},"item_8_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"公益社団法人日本金属学会"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2320/jinstmet.J2017009 ","subitem_relation_type_select":"DOI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0021-4876","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"上浦, 良友"}],"nameIdentifiers":[{"nameIdentifier":"487273","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"梅澤, 憲司"}],"nameIdentifiers":[{"nameIdentifier":"487274","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"寺岡, 有殿"}],"nameIdentifiers":[{"nameIdentifier":"487275","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"吉越, 章隆"}],"nameIdentifiers":[{"nameIdentifier":"487276","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"寺岡 有殿","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"487277","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"窒素イオンで照射された多結晶タングステン表面のX線光電子分光による評価","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"窒素イオンで照射された多結晶タングステン表面のX線光電子分光による評価"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-02-06"},"publish_date":"2018-02-06","publish_status":"0","recid":"48468","relation_version_is_last":true,"title":["窒素イオンで照射された多結晶タングステン表面のX線光電子分光による評価"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T23:27:43.933798+00:00"}