{"created":"2023-05-15T14:37:07.968752+00:00","id":47863,"links":{},"metadata":{"_buckets":{"deposit":"6ccfc704-b1b1-4ec1-a34d-5096634d3050"},"_deposit":{"created_by":1,"id":"47863","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"47863"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00047863","sets":["1"]},"author_link":["480528","480523","480524","480530","480526","480529","480527","480522","480525"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2017-02","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"23","bibliographicPageEnd":"234311-5","bibliographicPageStart":"234311-1","bibliographicVolumeNumber":"145","bibliographic_titles":[{"bibliographic_title":"The Journal of Chemical Physics"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"高感度表面分析手法として期待されるMeV級C60を１次ビームに用いた２次イオン質量分析法において、２次イオンの放出過程は未解明である。そこで、１個のC60の衝突により放出される２次イオンの個数分布を確率分布として解析することにより、放出過程を推察した。具体的には、高分子試料(PMMA)に飛程の異なるC60(0.12MeV-0.54MeV)を照射し、放出される２次イオン数と質量を計測した。解析の結果、確率分布をポアソン分布でフィッティングできることを明らかにした。２次イオンが生成される深さの違いで試料表面までの輸送割合が異なると、ポアソン分布ではフィッティングできないため、試料の深いところで生成されたイオンも、浅いところと同様の割合で試料表面から放出されていることが推察された。","subitem_description_type":"Abstract"}]},"item_8_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"AIP Publishing"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1063/1.4972061","subitem_relation_type_select":"DOI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0021-9606","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"平田浩一"}],"nameIdentifiers":[{"nameIdentifier":"480522","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"山田, 圭介"}],"nameIdentifiers":[{"nameIdentifier":"480523","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"千葉敦也"}],"nameIdentifiers":[{"nameIdentifier":"480524","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"鳴海, 一雅"}],"nameIdentifiers":[{"nameIdentifier":"480525","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"齋藤勇一"}],"nameIdentifiers":[{"nameIdentifier":"480526","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"山田 圭介","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"480527","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"千葉 敦也","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"480528","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"鳴海 一雅","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"480529","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"齋藤 勇一","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"480530","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Characterization of secondary ion emission processes of sub-MeV C60 ion impacts via analysis of statistical distributions of the emitted ion number","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Characterization of secondary ion emission processes of sub-MeV C60 ion impacts via analysis of statistical distributions of the emitted ion number"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-04-27"},"publish_date":"2017-04-27","publish_status":"0","recid":"47863","relation_version_is_last":true,"title":["Characterization of secondary ion emission processes of sub-MeV C60 ion impacts via analysis of statistical distributions of the emitted ion number"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T23:34:42.938359+00:00"}