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Electronic Testing of 4H-Silicon Carbide Schottky Barrier Diodes under High Temperature

https://repo.qst.go.jp/records/2002938
https://repo.qst.go.jp/records/2002938
d6b8cde0-4dd8-4e68-8816-559165105e13
アイテムタイプ 会議発表論文 / Conference Paper(1)
公開日 2026-03-05
タイトル
タイトル Electronic Testing of 4H-Silicon Carbide Schottky Barrier Diodes under High Temperature
言語 en
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_5794
資源タイプ conference paper
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Daryl Giglio

× Daryl Giglio

Daryl Giglio

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Jarod Remy

× Jarod Remy

Jarod Remy

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Makino Takahiro

× Makino Takahiro

Makino Takahiro

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Cao Lei Raymond

× Cao Lei Raymond

Cao Lei Raymond

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内容記述タイプ Abstract
内容記述 This work characterized 4H-SiC Schottky Barrier Diodes (SBDs) for high-temperature applications, tested from room temperature to 600°C using a low-noise heated semiconductor probe station. The devices, with nitrogen doping at 1.7 × 1014 cm⁻³ and a 36 μm epitaxial layer, exhibited leakage currents ranging from 0.15 – 1.0 nA at room temperature to microampere levels at 600°C under -100V bias, remaining suitable for alpha spectroscopy with a depletion depth of approximately 25 μm. Consistent performance across multiple devices and reduced leakage after 600°C exposure suggest defect annealing. A reduction in leakage current was observed following measurements up to 600 °C, which may indicate the annealing of defects at elevated temperatures. Hysteresis measurements at elevated temperatures demonstrated a reduction in the loop difference as temperature increased.
書誌情報 4H-SiC Schottky barrier diodes at pA level leakage current and performance evaluation up to 600°C

発行日 2025-09
DOI
識別子タイプ DOI
関連識別子 10.1117/12.3062442
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