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Study of chemical content effects for oxide formation on HIPed interface during the fabrication process by comparison of F82H steel with FeCrAl alloy

https://repo.qst.go.jp/records/2001935
https://repo.qst.go.jp/records/2001935
4cd20319-28c5-4fd1-ab40-0f5c7872efa4
アイテムタイプ 学術雑誌論文 / Journal Article(1)
公開日 2025-11-26
タイトル
タイトル Study of chemical content effects for oxide formation on HIPed interface during the fabrication process by comparison of F82H steel with FeCrAl alloy
言語 en
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
著者 Hirotatsu Kishimoto

× Hirotatsu Kishimoto

Hirotatsu Kishimoto

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Tamaki Shibayama

× Tamaki Shibayama

Tamaki Shibayama

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Takashi Nozawa

× Takashi Nozawa

Takashi Nozawa

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Hiroyasu Tanigawa

× Hiroyasu Tanigawa

Hiroyasu Tanigawa

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内容記述タイプ Abstract
内容記述 Reduced-activation ferritic/martensitic steel (F82H) is considered as a promising structural material for the fusion blanket structural system following the DEMO reactor. For blanket fabrication, hot isostatic pressing (HIP) is employed for the production of components with complex geometries. A key challenge associated with the HIP processing of F82H steels is the formation of silicon oxide at the HIPed interface, which results in reduced joint toughness. This study investigates the correlation between the thermodynamic stability of oxides and researches whether the silicon precipitation is the special property of silicon or not. An FeCrAl alloy containing Si was selected for comparison with F82H steel, and both materials were subjected to identical processing conditions. Silicon oxides were observed at the F82H steel-HIPed interface, whereas aluminum oxides were observed in the FeCrAl alloy. No Si precipitation or accumulation was detected at the HIP-treated interface of the FeCrAl alloy. This research showed that the silicon precipitation on F82H HIPed interface is not a special property of silicon but a general behavior of the elements along the thermodynamics and formation energy of oxides.
書誌情報 Fusion Engineering and Design

巻 222, p. 115541, 発行日 2025-11
出版者
出版者 ELSEVIER
DOI
識別子タイプ DOI
関連識別子 10.1016/j.fusengdes.2025.115541
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