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Practical rule for trimming the DFT-1/2 self-interaction: Band gap, absolute band alignment, and defect properties of semiconductors

https://repo.qst.go.jp/records/2001933
https://repo.qst.go.jp/records/2001933
847eee19-0c48-42d4-bcfd-26a0c0c281f5
アイテムタイプ 学術雑誌論文 / Journal Article(1)
公開日 2025-11-25
タイトル
タイトル Practical rule for trimming the DFT-1/2 self-interaction: Band gap, absolute band alignment, and defect properties of semiconductors
言語 en
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
著者 Chishu Homma

× Chishu Homma

Chishu Homma

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Ryosuke Akashi

× Ryosuke Akashi

Ryosuke Akashi

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Yusuke Nishiya

× Yusuke Nishiya

Yusuke Nishiya

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Shinji Tsuneyuki

× Shinji Tsuneyuki

Shinji Tsuneyuki

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Yu-ichiro Matsushita

× Yu-ichiro Matsushita

Yu-ichiro Matsushita

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抄録
内容記述タイプ Abstract
内容記述 In recent years, density functional theory (DFT) for material design and discovery has gained significant interest. Traditional approximations with the DFT, like the local density approximation (LDA), tend to underestimate band gaps. On the other hand, the Heyd-Scuseria-Ernzerhof (HSE) method provides better accuracy for band gaps but at a high computational cost. In 2008, Ferreira et al. introduced the DFT-1/2 method, which improves band gap predictions at a computational cost similar to LDA. This method adjusts the valence band energy levels by applying Self-Interaction Correction at the local potential level. The extent of this correction is determined by a parameter called 'cutoff,' which must be self-consistently calculated. Although DFT-1/2 is computationally efficient, it requires extra effort in parameter tuning. Moreover, it may not accurately predict band gaps for certain materials, such as narrow-gap semiconductors. Variations like DFT-1/4 or shDFT-1/2 have been developed to address this issue, providing more accurate band gaps for these materials but reducing accuracy for others. Therefore, choosing the optimal method is essential and material-dependent. To overcome these empirical challenges, we introduce a novel parameter-free approach in the framework of DFT-1/2 (parameter-free DFT-1/2). Unlike the original DFT-1/2, which requires an additional self-consistent field (SCF) loop to determine the cutoff radius that maximizes the band gap, our proposed method calculates the cutoff radius directly from the crystal structure, thus eliminating the need for the extra SCF loop. We validated the performance of parameter-free DFT-1/2 by calculating key electronic properties such as band gaps, effective masses, ionization energies, and electron affinities. We also assessed defect levels in the charge transition states of a silicon point defect in silicon carbide (SiC) for the first time. The results demonstrate that parameter-free DFT-1/2 can reproduce spin density with accuracy comparable to HSE and that parameter-free DFT-1/2 is also effective for predicting charge transition levels in defects.
書誌情報 Physical Review B

巻 112, 号 115111, 発行日 2025-09
出版者
出版者 アメリカ物理学会
DOI
識別子タイプ DOI
関連識別子 10.1103/mp93-55g3
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