| アイテムタイプ |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2023-07-07 |
| タイトル |
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タイトル |
Propagation effects in high-harmonic generation from dielectric thin films |
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言語 |
en |
| 言語 |
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言語 |
eng |
| 資源タイプ |
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資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
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資源タイプ |
journal article |
| 著者 |
Yamada Shunsuke
Otobe Tomohito
David Freeman
Anatoli Kheifets
Kazuhiro Yabana
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| 抄録 |
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内容記述タイプ |
Abstract |
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内容記述 |
Theoretical investigation is conducted of high-order harmonic generation (HHG) in silicon thin films to elucidate the effect of light propagation in reflected and transmitted waves. The first-principles simulations are performed of the process in which an intense pulsed light irradiates silicon thin films up to 3000 nm thickness. Our simulations are carried within the time-dependent density functional theory (TDDFT) with the account of coupled dynamics of the electromagnetic fields and the electronic motion. It was found that the intensity of transmission HHG gradually decreases with the thickness, while the reflection HHG becomes constant from a certain thickness. Detailed analyses show that transmission HHG have two origins: the HHG generated near the front edge and propagating to the back surface, and that generated near the back edge and emitted directly. The dominating mechanism of the transmission HHG is found to depend on the thickness of the thin film and the frequency of the HHG. At the film thickness of 1000 nm, the transmission HHG with the frequency below 20 eV is generated near the back surface, while that with the frequency above 20 eV is generated near the front edge and propagates from there to the back surface. |
| 書誌情報 |
Physical Review B
巻 107,
号 3,
p. 035132,
発行日 2023-01
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| 出版者 |
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出版者 |
American Physical Society |
| ISSN |
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収録物識別子タイプ |
ISSN |
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収録物識別子 |
2469-9969 |
| DOI |
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識別子タイプ |
DOI |
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関連識別子 |
10.1103/PhysRevB.107.035132 |
