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  1. 原著論文

Impact of formation process on the radiation properties of single-photon sources generated on SiC crystal surfaces

https://repo.qst.go.jp/records/82865
https://repo.qst.go.jp/records/82865
fb4fd71e-f929-4f06-8204-70c6d8fc504e
Item type 学術雑誌論文 / Journal Article(1)
公開日 2021-05-24
タイトル
タイトル Impact of formation process on the radiation properties of single-photon sources generated on SiC crystal surfaces
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Hijikata, Yasuto

× Hijikata, Yasuto

WEKO 996540

Hijikata, Yasuto

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Komori, Shota

× Komori, Shota

WEKO 996541

Komori, Shota

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Otojima, Shunsuke

× Otojima, Shunsuke

WEKO 996542

Otojima, Shunsuke

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Yu-Ichiro, Matsushita

× Yu-Ichiro, Matsushita

WEKO 996543

Yu-Ichiro, Matsushita

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Takeshi, Ohshima

× Takeshi, Ohshima

WEKO 996544

Takeshi, Ohshima

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Takeshi, Ohshima

× Takeshi, Ohshima

WEKO 996545

en Takeshi, Ohshima

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内容記述タイプ Abstract
内容記述 Radiation centers that are generated on the surface of SiC crystals [surface single-photon sources (SPSs)] have received much attention because they behave as high-brightness SPSs at room temperature. However, little is known about surface SPSs, such as their defect structure and radiation properties. To achieve a better understanding of surface SPSs, we investigated the impact of the formation processes of SPSs on the radiation properties. Low temperature photoluminescence (PL) measurements indicated that the photon energies of the zero-phonon line (ZPL) were dispersed in the range of 0.33 eV. In comparison between the (0001) Si-face and (11–20) a-face, the energy dispersion for the a-face was smaller, which suggests that the energy dispersion was attributed to stacking faults at the oxide–SiC interface. The differences in
the radiation properties of the surface SPSs were clarified according to the formation process in terms of the oxide thickness and post oxidation Ar annealing. The results showed that the wavelength dispersion was increased with the oxide thickness, and Ar annealing caused various changes in the radiation properties, such as a reduction in the density of SPSs, and the radiation intensity of the ZPL as well as a shift in the ZPL wavelength. Notably, most of the changes in the defect structure occurred at the Ar anneal temperature of 600 C, and we discuss some of the types of defects that change at this temperature.
書誌情報 Applied Physics Letters

巻 118, 号 20, p. 204005-1-204005-6, 発行日 2021-05
出版者
出版者 AIP Publishing
ISSN
収録物識別子タイプ ISSN
収録物識別子 0003-6951
DOI
識別子タイプ DOI
関連識別子 10.1063/5.0048772
関連サイト
識別子タイプ URI
関連識別子 https://aip.scitation.org/doi/full/10.1063/5.0048772
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