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An estimation of line width roughness of photoresists due to photon shot noise for extreme ultraviolet lithography using the percolation model
https://repo.qst.go.jp/records/75579
https://repo.qst.go.jp/records/75579050477da-ebd3-4085-989f-c17be2231ccc
Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2019-04-11 | |||||
タイトル | ||||||
タイトル | An estimation of line width roughness of photoresists due to photon shot noise for extreme ultraviolet lithography using the percolation model | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
佐々木, 明
× 佐々木, 明× 石野, 雅彦× 錦野, 将元× Sasaki, Akira× Ishino, Masahiko× Nishikino, Masaharu |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | We numerically investigate image formation in a photoresist for extreme ultraviolet (EUV) lithography. We develop a simulation model based on percolation theory, which is applicable to the exposure and development of a metal nanoparticle resist. We model the formation of the negative- tone image by condensation of the resist particles after the absorption of EUV photons. We validate the model by making a comparison between the calculated and experimental contrast curve of the resist and show that the calculation reproduces the critical behavior of the image formation. With the model, we investigate the line width roughness of the image, which is caused by the effect of stochastic distribution of EUV photons, (e.g., photon shot noise). We discuss the dependence of the roughness on the dose as well as on the properties of the resist material, such as the absorption length, at a wavelength of 13.5 nm. | |||||
書誌情報 |
Japanese Journal of Applied Physics 巻 58, 号 5, p. 055002, 発行日 2019-05 |
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出版者 | ||||||
出版者 | The Japan Society of Applied Physics | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0021-4922 | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | 10.7567/1347-4065/ab06bc |