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{"_buckets": {"deposit": "295cd827-a495-41cb-b457-b4c7e273a9f8"}, "_deposit": {"created_by": 1, "id": "79469", "owners": [1], "pid": {"revision_id": 0, "type": "depid", "value": "79469"}, "status": "published"}, "_oai": {"id": "oai:repo.qst.go.jp:00079469", "sets": ["1"]}, "author_link": ["1004528", "1004531", "1004525", "1004529", "1004530", "1004524", "1004526", "1004527"], "item_8_biblio_info_7": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2020-01", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "6", "bibliographicPageEnd": "810 ", "bibliographicPageStart": " 805", "bibliographicVolumeNumber": "32", "bibliographic_titles": [{"bibliographic_title": "Journal of Photopolymer Science and Technology "}]}]}, "item_8_description_5": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "We examined the synthesis and resist properties of tellurium-containing molecular resist materials. By the condensation reaction of anisol, phenol, and 2-phenylphenol with tellurium tetrachloride (TeCl4), dichloro di(4-hydroxyphenyl) telluride (CHPT), dichloro di(4-hydroxy-3-phenylbenz) telluride (CHBT), di(4-hydroxyphenyl) telluride (HPT), and di(4-hydoxy-3-phenylbenz) telluride (HBT) were synthesized. These were reacted with 2-methyl-2-adamantyl bromo acetate, yielding corresponding compounds CHPT-AD, CHBT-AD, HPT-AD, and HBT-AD, respectively. By the examination of resist properties (thickness loss property, resist sensitivity, and etching durability), CHBT-AD could be good candidate for higher resolution EUV resist material.", "subitem_description_type": "Abstract"}]}, "item_8_publisher_8": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "Journal of Photopolymer Science and Technology "}]}, "item_8_relation_14": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type_id": {"subitem_relation_type_id_text": "10.2494/photopolymer.32.805", "subitem_relation_type_select": "DOI"}}]}, "item_8_relation_17": {"attribute_name": "関連サイト", "attribute_value_mlt": [{"subitem_relation_type_id": {"subitem_relation_type_id_text": "https://www.jstage.jst.go.jp/article/photopolymer/32/6/32_805/_article/-char/ja/", "subitem_relation_type_select": "URI"}}]}, "item_8_source_id_9": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0914-9244", "subitem_source_identifier_type": "ISSN"}]}, "item_access_right": {"attribute_name": "アクセス権", "attribute_value_mlt": [{"subitem_access_right": "metadata only access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_14cb"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Kudo, Hiroto"}], "nameIdentifiers": [{"nameIdentifier": "1004524", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Mari Fukunaga"}], "nameIdentifiers": [{"nameIdentifier": "1004525", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Teppei Yamada"}], "nameIdentifiers": [{"nameIdentifier": "1004526", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Shinji Yamakawa"}], "nameIdentifiers": [{"nameIdentifier": "1004527", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Takeo Watanabe"}], "nameIdentifiers": [{"nameIdentifier": "1004528", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Yamamoto, Hiroki"}], "nameIdentifiers": [{"nameIdentifier": "1004529", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kazumasa Okamoto"}], "nameIdentifiers": [{"nameIdentifier": "1004530", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Hiroki, Yamamoto", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "1004531", "nameIdentifierScheme": "WEKO"}]}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System"}]}, "item_type_id": "8", "owner": "1", "path": ["1"], "permalink_uri": "https://repo.qst.go.jp/records/79469", "pubdate": {"attribute_name": "公開日", "attribute_value": "2020-03-16"}, "publish_date": "2020-03-16", "publish_status": "0", "recid": "79469", "relation": {}, "relation_version_is_last": true, "title": ["Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System"], "weko_shared_id": -1}
Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System
https://repo.qst.go.jp/records/79469
https://repo.qst.go.jp/records/79469910c7cdb-0ad3-4688-b7db-c36ffe24560e
Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2020-03-16 | |||||
タイトル | ||||||
タイトル | Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
Kudo, Hiroto
× Kudo, Hiroto× Mari Fukunaga× Teppei Yamada× Shinji Yamakawa× Takeo Watanabe× Yamamoto, Hiroki× Kazumasa Okamoto× Hiroki, Yamamoto |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | We examined the synthesis and resist properties of tellurium-containing molecular resist materials. By the condensation reaction of anisol, phenol, and 2-phenylphenol with tellurium tetrachloride (TeCl4), dichloro di(4-hydroxyphenyl) telluride (CHPT), dichloro di(4-hydroxy-3-phenylbenz) telluride (CHBT), di(4-hydroxyphenyl) telluride (HPT), and di(4-hydoxy-3-phenylbenz) telluride (HBT) were synthesized. These were reacted with 2-methyl-2-adamantyl bromo acetate, yielding corresponding compounds CHPT-AD, CHBT-AD, HPT-AD, and HBT-AD, respectively. By the examination of resist properties (thickness loss property, resist sensitivity, and etching durability), CHBT-AD could be good candidate for higher resolution EUV resist material. | |||||
書誌情報 |
Journal of Photopolymer Science and Technology 巻 32, 号 6, p. 805-810, 発行日 2020-01 |
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出版者 | ||||||
出版者 | Journal of Photopolymer Science and Technology | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0914-9244 | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | 10.2494/photopolymer.32.805 | |||||
関連サイト | ||||||
識別子タイプ | URI | |||||
関連識別子 | https://www.jstage.jst.go.jp/article/photopolymer/32/6/32_805/_article/-char/ja/ |