量研学術機関リポジトリ「QST-Repository」は、国立研究開発法人 量子科学技術研究開発機構に所属する職員等が生み出した学術成果(学会誌発表論文、学会発表、研究開発報告書、特許等)を集積しインターネット上で広く公開するサービスです。 Welcome to QST-Repository where we accumulates and discloses the academic research results(Journal Publications, Conference presentation, Research and Development Report, Patent, etc.) of the members of National Institutes for Quantum Science and Technology.
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In this paper, we report on development of the soft x-ray laser (SXRL) irradiation system at QST. The SXRL has a wavelength of 13.9 nm, and this laser wavelength is close to the exposure wavelength of 13.5 nm for the extreme ultraviolet (EUV) lithography. The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto sample surface. So it is possible to examine and confirm damage/ablation thresholds of EUV optical elements and doses for sensitivity of resist materials, which have the same specifications of those in the EUV lithography.